paten4d rtp

As used herein, rapid thermal processing or RTP refers an apparatus or a process capable of uniformly heating a wafer at rates of about 50° C. rtp daget4d /second and higher, for example, at rates of 100° to 150° C /second, and 200° to 400° C /second Typical ramp-down (cooling) rates in RTP chambers are in the range of 80-150° C /second